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Updated 9 July 2010 Updated monthly, each list includes a cross-disciplinary sampling of the most frequently downloaded papers from SPIE Conference Proceedings and SPIE Journal papers. Each title is linked to the abstract page for that paper on the SPIE Digital Library. Astronomy: Modular bimorph mirrors for adaptive optics (Optical Engineering) Biomedical Optics & Medical Imaging: Laser speckle contrast imaging in biomedical optics (J. Biomedical Optics) Defense & Security: Latest developments in MCT for next generation of infrared staring arrays (Proceedings of SPIE) Electronic Imaging & Signal Processing: New strategy for image and video quality assessment (J. Electronic Imaging) Illumination & Displays: Novel concepts for OLED lighting (Proceedings of SPIE) Industrial Sensing & Measurement: Object tracking using an adaptive Kalman filter combined with mean shift (Optical Engineering)
Lasers & Sources:Static wavelength scanning using tunable external cavity laser diode (Optical Engineering)
Micro/Nano Lithography: 22-nm-node technology active-layer patterning for planar transistor devices (J. Micro/Nanolithography, MEMS, and MOEMS) Nanotechnology: Quantum-dot infrared photodetectors: a review (J. Nanophotonics) Optical Design & Engineering: Edge tool influence function library using the parametric edge model for computer controlled optical surfacing (Proceedings of SPIE) Optoelectronics & Communications: Optical satellite communications in Europe (Proceedings of SPIE) Remote Sensing: Hyperspectral image analysis using artificial color (J. Applied Remote Sensing) Solar & Alternative Energy: Nanostructures for high-efficiency photovoltaics (Proceedings of SPIE) Astronomy Biomedical Optics & Medical Imaging Electronic Imaging & Signal Processing Illumination & Displays Industrial Sensing & Measurement - 22-nm-node technology active-layer patterning for planar transistor devices (J. Micro/Nanolithography, MEMS, and MOEMS)
- EUV into production with ASML's NXE platform (Proceedings of SPIE)
- Evaluation of double-patterning techniques for advanced logic nodes (Proceedings of SPIE)
- Freeform illumination sources: an experimental study of source-mask optimization for 22-nm SRAM cells (Proceedings of SPIE)
- Generation of arbitrary freeform source shapes using advanced illumination systems in high-NA immersion scanners (Proceedings of SPIE)
- Lithographic qualification of new opaque MoSi binary mask blank for the 32-nm node and beyond (J. Micro/Nanolithography, MEMS, and MOEMS)
- Mask diffraction analysis and optimization for extreme ultraviolet masks (J. Micro/Nanolithography, MEMS, and MOEMS)
- Optics for EUV production (Proceedings of SPIE)
- Orientation Zernike polynomials: a useful way to describe the polarization effects of optical imaging systems (J. Micro/Nanolithography, MEMS, and MOEMS)
- Thin-absorber extreme-ultraviolet lithography mask with light-shield border for full-field scanner: flatness and image placement change through mask process (J. Micro/Nanolithography, MEMS, and MOEMS)
Optical Design & Engineering Optoelectronics & Communications Solar & Alternative Energy
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